【作者】 韦晓茹；

【导师】 陈林森；

【作者基本信息】 苏州大学 ， 光学工程， 2003， 硕士

【摘要】 激光直写技术是随着大规模集成电路的发展而于20世纪80年代中期提出的。激光直写是一种制作光刻掩模、衍射元件等的新技术。激光直写技术是将激光刻蚀、声光调制、光束准直以及计算机控制和数据处理等高新技术融为一体的技术。所谓激光直写，就是利用聚焦的激光光束，由计算机控制声光调制器的通断以及平台的移动，在光刻胶上进行曝光，经过显影后得到所需要的图形。激光直写系统要求的器件的精度非常高，我们目前的工作目标是首先实现激光直写系统的基本功能，在此基础上，再进行高性能系统的研制。本文的主要目的是建立了一种极坐标和直角坐标相结合的激光直写系统的原理样机，探讨系统的各部分器件的基本性能要求，为今后研制高精度激光直写系统做好工作基础，分析了激光直写系统中关键器件的性能要求，基本控制方式，实现了极坐标方式下，任意旋转角度直线图形与共心圆环的光刻。在文中探讨了在曲面条件下的激光直写焦深改进的措施。自定义了一种支持*.DXF文件的矢量文件(*.LDW)，从而实现了与AutoCAD软件的接口转换，使得系统支持矢量化运行，并且经过对*.DXF文件的转换后，实现了矢量化运行的数据量较小。我们还进行了*.ARR文件的激光直写实验，比较了*.LDW与*.ARR文件的不同之处。提出了线光栅干涉扫描实现条纹快速光刻的一种新方法。今后的工作有，定量研究光斑的质量对光刻线条的线宽、陡度等的影响，研究利用矢量化文件进行复杂图形的光刻控制的方式，改进系统的驱动方式和提高控制精度，增加自动调焦系统。定量研究灰度狭缝扫描获得高精度槽型光栅的方法等等。总之，因为系统中涉及的问题和工作非常多，不是论文中都能涉及到的，还有大量的工作要做。更多还原

【Abstract】 Photo masks are the backbone of micro-fabrication industries. Currently they are fabricated by lithographic process, which is very expensive and time consuming since it is a several step process. The laser direct writing system is the kind of tool that exposes the precision patterns by the micro-spot on the photosensitive material. This is a single step process and comparatively cheaper and faster than lithography.The laser direct writing system with polar coordinate and Cartesian coordinate is described in this paper. The properties of the key optical and electrical devices and the controlling mode in the system are put forwards. Using the polar coordinate lines with different directions and the circulars with the same axis can be written together.By using He-Cd laser (442nm) as writing light source, the system can directly write line with width 05#m on a sample. The *.dxf format file is used widely in the industries which stores data in vectorial mode. In the paper a new *.ldw file format to get the data from *.dxf format file is defined for supporting the vectorial model scanning of laser direct writing system.How to increase the depth of focus (DOF) of optical system is also discussed in this paper when writing pattern on the concave plates. Besides this, a new way to write lines with high resolution is proposed which is suitable to write the grating lines efficiently.The experimental results are presented and discussed in Sec.5. The factors attributed to the results are also given. Finally further research directions are discussed.更多还原