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新型功能光学薄膜的磁控溅工艺及物性研究

Magetron Sputtering Preparation and Chatacterization of Novel Functional Optical Films

【作者】 黄烽

【导师】 王海千;

【作者基本信息】 中国科学技术大学 , 凝聚态物理, 2009, 博士

【摘要】 光学功能薄膜涉及到光电产业、国防、环境科学等众多领域,具有很强的应用背景。本文利用磁控溅射技术制备了几种新型光学功能薄膜,主要包括:SiOx薄膜、YSZ耐高温光学薄膜、TiO2光催化和自清洁功能薄膜。通过对材料的筛选,对薄膜材料微结构及性能的调控,以及对制备工艺的研究与优化,取得了一些具有实用价值的研究成果。文中还对影响光学薄膜性能的内在因素和作用机理进行了分析和讨论。本论文的具体研究内容和主要结果如下:1.利用反应磁控溅射技术制备了不同氧化程度的SiOx薄膜,研究了不同温度下退火对其光学参数的影响。讨论了SiOx材料体系在不同温度下退火后,薄膜的微结构与组成的演变过程,具体包括相分离引起的成分变化,退火对样品应力的释放和对缺陷的修复作用,以及不同氧化程度薄膜折射率的变化机理等。2.针对光学薄膜在高温下的应用,研究了Nb2O5、Ta2O5等传统光学薄膜材料在高温下微结构及光学参数的劣化;提出了钇稳定氧化锆(YSZ)材料在耐高温光学薄膜领域的应用。从光学参数和微结构的稳定性等方面讨论了YSZ薄膜材料的耐温性能及机理。所获得的YSZ/SiO2多层膜光学器件在800℃下光学性能无明显退化。该结果拓展了光学薄膜在高温条件下的应用前景。3.发现了ZnO前驱层对TiO2薄膜的结晶增强的效应,并研究了该增强效应的机理。提出了利用ZnO前驱层来调控TiO2薄膜的结晶度和表面粗糙度的方法,研究了TiO2/ZnO薄膜的光催化和自清洁性能及影响因素。利用磁控溅射技术获得的TiO2/ZnO双层结构薄膜表现出比单层TiO2薄膜更加优越的光催化活性和亲水性。这一结果具有很好的工业应用前景。

【Abstract】 Optical thin films have been widely applied in optical communications, environment sciences,and military usages.In this work,a few novel optical functional thin films,including SiOx thin films,high temperature optical thin films, and self-cleaning thin films,were prepared by magnetron sputtering technique.Some results valuable for industrial applications were obtained by optimizing the materials, micro-structure and compositions,as well as the deposition processes.The factors and intrinsic mechanisms which may affect the properties of these functional films were also discussed.Based on the experimental studies and analyses,we have the following conclusions:1.SiOx films with different oxygen contents were prepared by reactive magnetron sputtering.The dependences of optical properties on the annealing temperature were studied.Influences of the annealing temperatures on the microstructure and compositional changes were studied.The phase separation,stress relaxation and healing effect,and the mechanisms of the optical refractive index changes of the SiOx films were discussed.2.In order to explore materials for high temperature applications,the deterioration behaviors of the traditional optical materials,such as Nb2O5 and Ta2O5,during annealing were studied.We found that the Yttria-stabilized Zirconia(YSZ) material can be used as an optical material and have excellent thermal stability. The optical properties and micro-structures of YSZ films were analyzed,and the intrinsic mechanisms of the thermal stability were discussed.The optical properties of the obtained YSZ/SiO2 multilayer films were stable at temperatures up to 800℃.This work extended the application of optical films to the high temperature area.3.ZnO buff layer was found to have a crystallinity enhancement affect to the TiO2 layer,the intrinsic mechanism was discussed.It is suggested that a ZnO under-layer can be used for tailoring the microstructure and surface morphology of TiO2 films.The photo-catalysis,self-cleaning property and the factor affecting the properties of the TiO2/ZnO double layer films were studied.It was found that the double layer films show better photo-catalysis and self-cleaning properties than TiO2 single layer films.This method has a promising application value in producing TiO2 self-clean thin films.

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