【作者】 赵海涛；

【导师】 张连珠；

【作者基本信息】 河北师范大学 ， 凝聚态物理， 2010， 硕士

【摘要】 使用PIC-MCC方法对氮气容性耦合射频辉光放电在射频电极处的离子能量分布和角度分布进行了数值模拟;计算了整个放电空间的电子碰撞激发率,电离率,离解率和离解电离率。模拟过程中考虑了电子与背景气体（氮分子N₂）的各种碰撞,以及两种离子（氮分子离子N₂+和氮原子离子N+）与背景气体（氮分子N₂）的碰撞;忽略了电子与离子之间的碰撞过程。具体工作如下所示:1.建立了氮气射频放电等离子体过程的PIC/MCC自洽的混合模型,其中带电粒子在电场中的运动及其产生的自洽场由PIC方法描述,粒子间的碰撞过程由MCC方法描述。用Fortran语言结合模型编写了一维的PIC/MCC模拟程序,模拟了氮气射频放电的物理过程。2.计算了氮气射频等离子体中射频电极处离子的能量分布和角度分布,及其随气压和电压幅值的变化。3.计算了氮气射频等离子体中整个放电空间电子碰撞激发率,电离率,离解率和离解电离率的分布,同时还计算了其随放电气压和电压幅值的变化情况。4.为了保证程序的准确性,与氮气的电子能量分布的实验结果进行了比较,结果比较吻合。总之,氮气射频辉光放电,是一个复杂的物理过程,放电既受到多种放电条件的制约,又相互影响,相互制约。研究这些放电条件之间的内在关系,对氮化合物材料的合成以及材料表面的氮化处理有大意义。本工作为氮气射频等离子体放电过程提供了理论参考依据。更多还原

【Abstract】 In capacitive coupling rf glow discharge of nitrogen ,energy and angle distribution of ions at electrode is numerically simulated by using the of PIC– MCC method. At the same time, we simulated the dissociation rate,ionization rate, excitation rate and dissociative ionization rate of electron at all the discharge room. Through the process of simulation, we not only considered the all kinds of collides of electron and nitrogen,but also ions and nitron. Since the value of section of all kinds of collides has big diffrence, we only considerd the elastic collisions and charge exchange collisions of ions and nitrogen. Ignoring the collisions of electronic and ion . Specific work shown below:1 Established the PIC-MCC hybrid model of the nitrogen rf plasma discharge, in the field of charged particle movement and the self-consistent way by the PIC, the process of collision between particles by MCC method. using Fortran language, a model of combining the PIC-MCC was writed, to simulate the process of nitrogen rf discharge.2 The calculation of nitrogen rf plasma energy and angle distribution of ions at the electrode and its distribution with discharge pressure and voltage amplitude variation.3 Calculating the nitrogen rf plasma discharge in the space of dissociation rate, electronic, ionization rates and the distribution of dissociation rate, also simulated with the discharge pressure and the changes of the voltage amplitude.4 In order to ensure the accuracy of the procedure, the nitrogen electronic energy distribution of experimental results were compared, and the results were good.Anyhow, nitrogen rf glow discharge, is a complex process of discharge at various discharge conditions. Study these discharge conditions of the inner link between the material of nitrogen, and the synthesis material surface has great significance nitriding process. This work for nitrogen rf plasma discharge provides a theoretical reference.更多还原