节点文献
用PECVD制备类金刚石膜的研究
Study of the Deposition of DLC Film by PECVD
【作者】 于玥；
【导师】 付秀华；
【作者基本信息】 长春理工大学 ， 光学工程， 2010， 硕士
【摘要】 本文以丁烷(C4H10)和氩气（Ar）为源气体,利用射频等离子体增强化学气相沉积法（RF-PECVD）在硅衬底上制备了类金刚石（DLC）薄膜。通过调整射频功率、基板偏压、衬底温度和源气体流量等工艺参数,沉积出了质量较好的类金刚石膜。并研究了工艺参数对薄膜沉积速率、硬度和表面粗糙度的影响。通过Raman光谱和傅里叶变换红外光谱（FTIR）分析了薄膜的结构,所制备的薄膜符合DLC膜的典型特征;用原子力显微镜对薄膜的表面形貌进行了观察,薄膜为表面致密、平整的非晶态结构;通过纳米压痕仪测试了薄膜的硬度;Taylor轮廓仪测试了薄膜的表面粗糙度。通过测试结果分析讨论了工艺参数对DLC薄膜性能的影响。
【Abstract】 In this paper, we deposited diamond-like carbon （DLC） films on the Si substrate using butane (C4H10) and argon （Ar） as source gases by radio frequency plasma enhanced chemical vapor deposition （RF-PECVD）.Through adjusting technical parameters such as radio frequency power, bias voltage, substrate temperature and the flow rate of the source gase, we obtained high quality DLC films. The effect of technical parameters on deposition rate, hardness and surface roughness of DLC films were researched.The microstructure of the films were studied with Raman spectroscopy and FTIR. The morphology of the films were studied with Atomic Force Microscope（AFM）.The thin film was dense, smooth and structurally amorphous. The hardness and surface roughness of the films were measured by nano-indenter and Taylor profilometer. Finally the effect of technical parameters on the properties of DLC films were discussed with measure results.