【作者】 张秀丽；

【导师】 张飞虎；

【作者基本信息】 哈尔滨工业大学 ， 机械制造及其自动化， 2009， 硕士

【摘要】 在惯性约束聚变固体激光驱动器、强激光武器及核武器等关键设备所需的众多光学元器件中,KDP晶体作为一种优质的非线性材料,被广泛地应用于激光和非线性光学领域。但由于其具有软脆、易潮解、对温度变化敏感等特点,给高质量的加工要求带来了极大的困难,目前被公认为最难加工的光学零件之一。为了探索软脆功能晶体材料KDP的超精密加工新方法,本文从KDP晶体易潮解的性质出发,研究晶体潮解的机理,研究利用潮解原理实现KDP晶体的抛光加工,最终获得一种新的超精密加工方法,并在此基础上配制抛光液,分析比较各工艺条件对抛光效果的影响。在本文中,首先通过对KDP晶体材料特性以及潮解机理的研究分析了KDP晶体潮解抛光的材料去除机理;并通过分析知道KDP晶体在纯水中的溶解速度很快并且很难控制,用纯水作为抛光液很难达到加工要求。为此本文对KDP晶体潮解抛光的抛光液配方进行了研究。选择乙醇作为水的稀释剂,并通过实验发现仅使用水和乙醇的混合液作为抛光液抛光KDP晶体得到的抛光效果不好,研究发现表面活性剂在化学机械抛光中起着重要作用,所以在抛光液中加入表面活性剂。用已选取的各个抛光液的成分配制不同成分比例的抛光液进行抛光实验,通过对抛光后材料去除率及表面粗糙度的分析,最终确定性能良好的抛光液组成。最后,通过对影响潮解抛光KDP晶体的去除率及表面质量的主要工艺参数的分析,选择了四个主要的工艺参数利用已经配制好的抛光液进行单因素实验。通过对抛光后的材料去除率以及表面粗糙度的分析,研究各参数对抛光效果的影响规律,并总结出了最佳的压力、抛光液流量等工艺条件,最后研究了抛光垫对抛光效果的影响。为潮解抛光KDP晶体技术的进一步深入研究奠定了基础。更多还原

【Abstract】 On the high-energy multi-path Inertial Confinement Fusion solid laser driver, laser weapon and other advanced equipment, only the large-size non-linear electrical-optical crystal KDP with high accuracy can be used to make optical frequency multiplication transition and switch parts. However, it is difficult for KDP crystal to machine because of its properties of the softness, brittleness, deliquescence and sensitivity to the change of temperature.In order to explore a new method of ultra-precision machining of KDP crystals,the deliquescence mechanism of KDP crystals was studied, and on the basis of the obtained results the mechanism of deliquescence polishing was analyzed, and the slurry was developed, and the surface quality was also analyzed by changing technological conditions.In this paper, through study of material characteristic and the deliquescence mechanism of KDP crystals the experiments of the KDP crystal dissolution in water, we can conclude that the pure water can not be used as slurry, because it is difficult to achieve the processing requirements. So, in this paper the slurry was studied.Ethanol was chosen as the diluent of water, and the result of the KDP crystal polished only using the mixture of water and ethanol as the slurry was not so good. The surfactant in the chemical mechanical polishing plays an important role, which was found in others research. So the surfactant was added to the slurry. Polishing experiments were done using slurry of different proportion constituents which had been chosen. Through the analysis of the material removal rate and the surface roughness of the KDP crystals after polished, the slurry of the most excellent performance can be identified. At last, the slurry was prepared.Finally, through the analysis of the main processing parameters affecting the material removal rate and the surface quality after polishing, using the good preparation slurry, selecting the four main processing parameters, the single factor experiments were done. The laws of each parameter affecting the polishing results were studied through the analysis of the material removal rate and surface roughness of the KDP crystals after polishing. And the best processing conditions, such as the pressure and the slurry flow were summed up. At last, the effect of polishing pad on the polishing quality was studied. The study will be the basis for the further study of the deliquescence polishing technology of KDP crystal.更多还原