【作者】 吴建林；

【导师】 高锦章； 杨武；

【作者基本信息】 西北师范大学 ， 分析化学， 2008， 硕士

【摘要】 低温等离子体技术是上世纪后期出现的一种新型水处理技术,即在常温常压下,通过非法拉第电解可以产生大量活性粒子,如羟基自由基(·OH)(标准氧化电位为2.80V),以及紫外线和冲击波,对水体中的污染物有很强的破坏作用。该类报道甚多,相对而言,对于活性粒子的测定研究较少。本文的目的之一就是研究辉光放电电解等离子体中羟基自由基的测定方法;同时研究了自由基引发的聚合反应,合成高分子阻垢剂。结果表明,所建立的分析方法和合成方法均有实际应用价值。论文由五章组成:第一章介绍了等离子体的基本概念,综述了羟基自由基的检测方法和应用范围、自由基引发阻垢剂合成的现状,最后,简要介绍了实验中用到的正交实验方法。第二章以水杨酸为捕获剂,采用高效液相色谱检测了接触辉光放电产生的羟基自由基,在体系pH值为3.2的条件下,考察了放电电压和溶液电导率对辉光放电等离子体中产生的羟基自由基浓度的影响,并半定量地计算了辉光放电电解过程中羟基自由基的产量与实验条件之间的关系。第三章对辉光放电等离子体技术引发合成高分子聚合马来酸酐-丙烯酰胺共聚物阻垢剂进行了研究,借助正交设计法,考察了原料浓度、电压、后聚合时间等因素对聚合物分子量、阻垢率的影响。第四章对辉光放电等离子体技术引发合成高分子聚合马来酸酐-丙烯酸共聚物阻垢剂进行了研究,借助正交设计法,考察了原料浓度、电压、后聚合时间等因素对聚合物分子量、阻垢率的影响。第五章对辉光放电等离子体技术引发合成高分子聚合马来酸酐-丙烯酸-丙烯酰胺共聚物阻垢剂进行了研究,借助正交设计法,考察了原料浓度、电压、后聚合时间等因素对聚合物分子量、阻垢率的影响。更多还原

【Abstract】 The low-temperature plasma in aqueous solution is one of the emerging technologies for water-treatment which appeared in the early 1980’s. It has received extensive attention in many fields in the world, due to its high degradation efficiency, instrumental simplicity, and amenability to the environment. It is worth notice that there are a lot of energetic species such as hydroxyl radical, caused by contact glow discharge plasma. So far, very few papers deal with the determination of hydroxyl radical yielded in the CGDE process. Thus, one of our purposes is to find a convenience method to detect hydroxyl radical in quantity. And then, an approach to initiate some polymerization was also discussed in detail. .This paper includes five chapters:Chapter 1 gives a review on the low temperature discharge plasma, the determination of hydroxyl radical and its application to the polymerization. In addition, the arithmetic of orthogonal design was also described in brief.Chapter 2 examines the effect of some of variable parameters, such as discharging voltage and electric conductivity, on the yield of hydroxyl radical during the glow discharge process at the solution pH value of 3.2, and semiquantitatively observes the relationship between output of hydroxyl radical and influencing factors.Chapter 3 studies the polymerization of maleic anhydride, acrylamide. The effects of applied voltage, concentration of reactants, time of polymerization on molecular weight of scale inhibitor.Chapter 4 investigates the polymerization of maleic anhydride, acrylic acid. The effects of applied voltage, concentration of reactants, time of polymerization on molecular weight of scale inhibitor.Chapter 5 researches the polymerization of maleic anhydride, acrylic acid, acrylamide. The effects of applied voltage, concentration of reactants, time of polymerization on the molecular weight of scale inhibitor .更多还原