HCD离子镀生产过程自动控制系统的设计与开发

【作者】 黄浪尘；

【导师】 阳春华；

【作者基本信息】 中南大学 ， 控制理论与控制工程， 2008， 硕士

【摘要】 空心阴极（HCD）离子镀是基于材料表面处理的一种镀膜技术。其生产工艺过程复杂,要求控制的参数众多,同时被控对象存在耦合、非线性和时变特性,无法建立精确的数学模型,难以通过常规控制方法实现生产过程稳定化控制。据此,将先进控制理论、计算机与网络通讯技术应用到HCD离子镀生产过程,实现生产过程综合自动化,对提高产品的质量和生产效率有着极其重要的意义。同时也为其他离子镀设备计算机开发提供宝贵经验。论文详细介绍了HCD离子镀生产过程计算机控制系统的研究和设计的方法。在分析HCD离子镀机理的基础上,探讨了温度、气体（N₂、Ar）流量以及真空度对离子镀质量的影响,分析了影响离子镀温度、气体（N₂、Ar）流量和真空度的主要因素。以对离子镀温度有直接影响的基体偏压为被控对象,引入一种改进的模糊控制算法;以气体（N₂、Ar）流量为控制对象,引入变比值双闭环控制系统;以罗茨泵为控制对象,利用变频器,通过调节罗茨泵的转速实现炉子真空度的控制。针对HCD离子镀特点设计了其生产过程计算机控制系统的总体结构和网络结构。利用WinCC组态软件,开发了离子镀生产过程的监控系统。经过调试,系统已投入使用,现场运行结果表明系统稳定性好,可靠性高,达到了设计目标要求。更多还原

【Abstract】 As a material surface treatment plating technology, Hollow Cathode Discharge （HCD） ion plating is a complex production process with many control parameters, and has the characteristics of coupling, nonlinear and time-varying. It cannot be described with a precise mathematical model and it is difficult to realize process stability control by conventional control methods. Therefore, using advanced control theory, computer and network communication technology, the developed automation control system for HCD ion plating production process can realize the production process comprehensive automation and improve production quality and production efficiency. Moreover, it is of great significance for other’s ion plating enterprise to design and develop computer automation control system.In this paper, HCD ion plating production process computer control system research and design approach is described in detail. On the basis of the analysis of HCD ion plating, discussed the effects of temperature, gas （N₂, Ar） flow, vacuum on plating quality on ion plating, as well as the main factors affecting the ion plating temperature, gas （N₂, Ar） flow and vacuum. The temperature on ion plating to have a direct impact on the substrate bias is charged with objects. In this paper, we introduced an improved fuzzy control algorithms. Selecting the gas （N₂, Ar） flow as the control objective, a double closed-loop control system with variable ratio is proposed. With the control objective of the Roots pump, the furnace vacuum control is realized by adjusting the pump speed through the inverter.Based on HCD ion plating characteristics, the overall structure and network structure of the production process computer control system is designed. Using WinCC configuration software, the monitoring software for ion plating production process is designed and implementation process is analyzed and discussed. After debugging, the system has been put into use and the results of the on-site operation show that system has good stability, high reliability and achieves the design objectives and requirements.更多还原