【作者】 杜欣荣；

【导师】 马剑平；

【作者基本信息】 西安理工大学 ， 微电子学与固体电子学， 2008， 硕士

【摘要】 随着微电子学、微光学、微机械技术的迅猛发展,微细加工技术也得到了不断的提高和改进。微光学元件也在现在通讯、军事应用、空间技术、超精加工、信息处理、生物医学以及娱乐消费等众多领域中得到广泛应用。这使得与微光学息息相关的设计、制作及应用技术也得到了越来越多的重视。微光学在设计理论与制作方法上已有了很大的发展,为了进一步扩大微光学元件的应用领域,对其制作方法也提出了更多更高的要求。因此,研究便捷、有效、实时、灵活的微光学元件的制作方法仍然是目前国内外微光学领域的一个极为重要的研究方向。本论文设计了一个基于DMD的数字无掩模光刻成像系统,对实验中的影响因素及系统中引入的误差因素进行了详细的分析,并提出了相应的补偿方法及解决方法。其主要工作如下:第一、在分析目前光刻工艺发展状况的基础上,论证了设计数字无掩模光刻系统的必要性及紧迫性。通过对DMD芯片的深入分析,获取设计中需应用的原理及关键参数。第二、在学习衍射、折射光学原理的基础上,提出了三种设计基于DMD的数字无掩模光刻成像系统的方案,并通过实验验证了其可行性。对比三种方案的实验结果,得出最优方案并对其中的关键部件的主要参数进行了最优化的设计。第三、详细分析了数字无掩模光刻系统中对曝光图形质量的主要影响因素,并提出了相应的补偿方法;详细分析了本论文提出的数字无掩模光刻成像系统中引入的误差因素,并分别提出了消除各个误差因素的解决方法。更多还原

【Abstract】 With the rapid development of micro-electronic, micro-optics, and micro-mechanism, imperceptibly process technology is continually improved and ameliorated. Micro-optics devices are applied for most fields, likes communication, military affairs, space technology, exceed finish machining, information dispose, biology-physic and amusement consumption. It is result in that more and more people attach importance to design, execution and application technology relate to micro-optics.Micro-optics is prodigious developed on design theory and execution. For extend the application fields of micro-optics devices, there is more and more demand for its execution means. So, at present, it is a very important research field about micro-optics inside and outside that researching execution of convenient, efficiency, real time, flexible micro-optics devices. In this paper, it presents a design measure of maskless lithography imaging system based on DMD. It analysis the influence factors and error factor in this system in detail, and presents relevant resolvent. The central works are as follows:Firstly: Based on analyze the development status of lithography technologic at present, this paper demonstrate that design maskless lithography is necessary and urgently. Through analyze DMD, we obtain some require principle and key parameters.Secondly: Based on study the principle diffraction optics, this paper presents three different schemes about design the maskless lithography imaging system based on DMD, and validate the feasibility through experimentation. Compared the results of three schemes, and educe the most optimization and the optimization parameters of its key parts.Thirdly: Labouredly the mostly influence factors of maskless lithography, and give the equalize measures; labouredly the mostly error factors of this system, and give the resolvent idiographic.更多还原