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离子辅助电子束蒸镀制备凹印版材耐磨层的研究

Study on the Preparation of Intaglio Plate Wear-resistant Coatings by Means of Ion Assisted Electron Beam Physical Vapor Deposition

【作者】 王正铎

【导师】 张广秋; 葛袁静;

【作者基本信息】 北京印刷学院 , 材料物理与化学, 2005, 硕士

【摘要】 针对凹版电镀镀铬存在的污染和氢脆问题,本课题采用离子辅助电子束蒸镀技术,以金属铬为原料,在镍、铜等凹版材料表面制备了硬铬耐磨层。研究了设备和工艺对膜层制备与性能的影响;采用光学金相显微镜、扫描电子显微镜(SEM)、原子力显微镜(AFM)、显微硬度计、表面轮廓仪、划痕仪等对样品的表面形貌、断面结构、表面粗糙度、硬度、附着牢度等进行了研究,并同电镀镀铬样品作了对比分析。 研究结果表明: 1. 通过优化设备与工艺,用离子辅助电子束蒸镀方法制备凹版硬铬耐磨层是可行的。铬膜层的硬度可以达到甚至超过电镀镀层;表面粗糙度基本相当;优化工艺条件下的附着力可以达到电镀水平。 2. 离子束的清洗和辅助效应,在膜制备过程中起到至关重要的作用。没有离子束参与时,很难得到附着良好的膜层。基体预处理、过渡层、电子枪工作参数等工艺因素,都对膜的生长过程、微观结构和最终性能产生影响。 3. 膜表面的微观形貌呈颗粒状排布,颗粒尺寸 50~250nm,不同工艺条件下的颗粒尺寸大小和排列方式有所区别。离子辅助的膜表面,颗粒更细小,排列更紧密,这有助于提高膜的性能。 4. 样品断面的 SEM 上可观察到膜、基之间的界面或过渡层。过渡层的厚度100~200nm;离子辅助样品的界面出现轻微扩散,可以增强膜的性能。 5. 膜层的微裂纹、孔洞、杂质、晶界空隙等,是降低膜层性能的主要因素。可以通过设备与工艺条件的优化来减少这些缺陷。

【Abstract】 Hard chromium wear-resistant coatings on the intaglio plate materialswere deposited by means of ion assisted electron beam physical vapordeposition (IA-EBPVD), so as to solve the problems of polluting andhydrogen-embrittlement from the electroplating. The influences by equipmentsand technologies on the coatings’ depositing & performance are presented.The morphologies and mechanical properties (Hardness, Roughness andAdhesion etc.) were studied using optical metallographic microscopy, scanningelectron microscopy (SEM), atomic force microscopy (AFM), micro-hardnesstester, profile meter, and scratch tester. Some results were analyzed andcompared with those of the electroplated coatings. The results show that: 1. It is feasible to obtain Cr wear-resistant coatings on intaglio plate byIA-EBPVD with optimized equipments and technologies. The hardness canreach or even surpass that of the electroplated one. The roughness of thesurface is almost the same as the latter. The adhesion can reach that of theelectroplated due to the introduction of the optimized process. 2. The ion bombardment is of primary importance during the deposition.It’s difficult to obtain perfect adhesive coatings without ion bombardment.Other technologic factors, such as substrate-pretreating, interlayer andoperating parameters of the electron gun, can influence the coatings’ growth,microstructure and mechanical properties. 3. Grains with the size of 50~250nm are observed by AFM on thesurface. The size and arrangement of the grain on different coatings whichwere deposited via different process are different. The grains are much finer insize and much compact in arrangement as the result of ion bombardment,which is useful to improve the performance of the coatings. 4. Interlayer or interface between the coating and substrate can be II<WP=4>observed on the sectional view by SEM. The thickness of the interlayer isabout 100~200nm. Ion bombardment can result in slight diffusion betweenthe interfaces, resulting in improvement of the performance of the coatings. 5. There are some micro-gaps, micro-holes and impurities in thecoatings, which is the primary reason of degrading the performance of thecoatings. The flaws can be reduced with optimized equipments andtechnologies.

  • 【分类号】TG174.45
  • 【被引频次】1
  • 【下载频次】136
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