纳米晶金刚石薄膜场致发射特性研究

【作者】 殷吉昊；

【导师】 曾葆青；

【作者基本信息】 电子科技大学 ， 物理电子学， 2003， 硕士

【摘要】 近年来 ，国内外不断有实验和理论研究表明，金刚石薄膜特别是纳米晶金刚石薄膜，在低的开启电压作用下，即可获得很高的场致发射电流密度，具有十分优秀的场致电子发射特性，是一种理想的场致发射阴极材料。采用金刚石薄膜制备成的场致发射冷阴极在微波电真空器件和平面显示器等方面有着广阔的应用前景。微波等离子体增强化学气相沉积法（MPCVD法）是众多低气压下激活CVD工艺方法的一种，也是目前在国内外比较流行的制备金刚石薄膜的工艺方法之一。其特点是低温、低压、清洁。本论文中，作者分析了MPCVD方法中气源成分比、微波功率、等离子体球的位置、成核技术等各种工艺条件对金刚石薄膜质量的影响，并总结得到了一些有意义的结论；同时，在自行研制的MPCVD沉积系统上，于4-7Kpa、1000℃左右的热力学条件下，采用CH4/H2气源气氛在光滑的硅衬底上制备出了晶粒尺寸在300纳米以下的纳米晶金刚石薄膜，测试得到了较好的薄膜场致电子发射性能，为金刚石薄膜场致发射冷阴极的研究工作打下了实验基础。更多还原

【Abstract】 Recently, a number of experiments and theoretical researches have showed that diamond thin films，especially nanocrystalline diamond thin films, could emit electrons at very low fields, and be well suited for field emission cold cathode which is applied in many field emission applications, such as microwave vacuum devices and field emission displays.Microwave plasma chemical vapor deposition (MPCVD) ,a kind of chemical vapor deposition method with low temperature，low intensity of pressure and clearance ，is commonly used for the growth of diamond thin films.In this paper，first ,the author drew some important conclusions by analyzing several technical factors and experimental conditions which would have great influence on the quality of diamond thin films during MPCVD process，including gas proportion，the power of microwave，the plasma’s location ,the nucleation technique ,etc.. Finally，the author has successfully deposited nanocrystalline diamond thin films with 300nm crystal particles on the slick surface of silicon by using CH4/H2 gases in the MPCVD system，and the nanocrystalline diamond thin films was proved to have good field emission performance. All these researches will make the foundation for the field emission cathode of diamond films.更多还原