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光纤定位硅V型槽的设计与制作

The Design and Fabrication of Silicon V-Groove Arrays

【作者】 郝永芹

【导师】 钟景昌;

【作者基本信息】 长春理工大学 , 凝聚态物理, 2002, 硕士

【摘要】 通过光纤把外部光源引入SOI集成光路时,为减少偶然因素对耦合效率的影响,需解决光纤定位问题,以及为提高多通道波导型器件、半导体激光器阵列、光开关阵列等与光纤的耦合效率问题,作者利用单晶硅材料,设计并制作出具有高精度光纤定位功能的硅V型槽及其阵列。 本文围绕硅V型槽的设计和制作,从理论上详细分析了单模光纤与脊形波导的模式特点,得出最佳的耦合条件,在此基础上设计出最合适的硅V型槽结构。在实践上,对制作工艺积极探索,提出新的制备硅掩蔽膜的工艺方案,对影响光刻质量的因素深入分析,试验摸索出适用于V型槽的各向异性湿法腐蚀的腐蚀液配方,独立优化设计了制作硅V型槽的相关工艺,制作出高质量的硅V型槽。并展示了它广阔的应用前景和科研产品的开发价值。

【Abstract】 In this paper , an emphasis is put on the design and fabrication of V- groove arrays. The material we use is monocrystalline silicon . Silicon V- groove structure can provide fiber with high precision orientation . So the problems about how to make light into SOI efficiently and coupling between multichannel waveguide devices and fibers can be solved .The coupled mode theory of single- mode fiber and ridge waveguide has been described and analyzed , and the best coupling condition is obtained . Based on the condition , the author makes a reasonable program . In order to make integration of theory with practice , a lot of experiments have been done . Mask-making technology , photoetching and wet-etching processes have been optimized . The author also presents the application and commercial value of silicon V- groove arrays.

【关键词】 光纤定位V型槽掩蔽膜各向异性腐蚀
【Key words】 Fiber orientationV grooveMaskAnisotropic etching .
  • 【分类号】TN256
  • 【被引频次】4
  • 【下载频次】270
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