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电子束蒸发制备TiO2薄膜及光学性能的研究

Study of the Deposition and Optical Properties of TiO2 Thin Films Deposited by Electronic Beam Evaporation

【作者】 赵利

【导师】 薛亦渝;

【作者基本信息】 武汉理工大学 , 材料加工工程, 2003, 硕士

【摘要】 TiO2具有高折射率,在可见光波段透明以及良好的化学稳定性,是非常重要的光学薄膜材料,近年来得到了非常广泛的应用。研究TiO2薄膜的制备具有较大的科学和应用价值。 本文用电子束反应蒸发法在K9玻璃上制备了TiO2薄膜。用正交试验法研究了制备过程中的主要工艺因素基片温度、沉积速率、真空度对薄膜的主要光学常数折射率以及消光系数产生的影响。薄膜的折射率和消光系数用椭圆偏振仪测量并计算得到,用分光光度计测量了膜的透射率光谱曲线,薄膜的微观形貌和结构由扫描电镜以及X射线衍射仪进行了分析。通过极差法确定了在电子束反应蒸发的制备条件下得到最佳光学性能的TiO2薄膜的工艺条件为:基片温度300℃、真空度2×10-2Pa、沉积速率0.2nm/s,得出了基片温度对TiO2薄膜光学性能影响最大的结论。用最佳工艺条件制备的薄膜在可见光波段的范围内有很好的透光性,在扫描电镜下观察到薄膜的结构为柱状纤维结构。 本文研究了退火工艺对不同基片温度下制备薄膜的结构以及光学常数的影响。对退火前后的薄膜进行了X射线衍射分析、透射光谱分析,表明退火可以使非晶态结构的TiO2薄膜晶化并可以使折射率以及吸收情况得到较大的改善,确定了使薄膜的组织结构全部为锐钛矿结构的退火工艺。完成了用电子束反应蒸发法得到优良光学性能以及结构的TiO2薄膜的工艺研究。 为了利用TiO2进一步设计和制备光学膜堆,笔者利用Visual Basic开发了一套膜系设计软件,该软件可完成膜系光学图谱计算,用包络线法进行光学常数分析,以及用单纯形调优法进行膜系优化设计。本文详细介绍了软件各个模块的工作原理,程序框图,以及计算分析结果。最后利用本软件优化设计出了一个TiO2-MgF2增透膜的膜系,理论透射率在400~700nm波长范围内可以达到99%以上,并进行了试制,样品实际透过率在97%以上,起到了光学增透的作用。

【Abstract】 TiO2 has high refractive index, be transparent in the wave band of visible and has excellent chemical stability. It is one of the most important coating materials and wasused widely in recent years. So there are large Science and Application values to study the preparation of TiOz thin films.TiOi film is deposited by reactive electronic beam evaporation on the K9 substrates. Through the orthogonal experiment the Influence of technological conditions (temperature of substrate, deposition rate, chamber vacuum) to optical property of TiC>2 film was studied. The refractive indices and the extinctioncoefficient of the films have been measured by spectroscopic ellipsometry. Optical properties and structure features have been characterized respectively by UV-VIS spectrophotometer, SEM and XRD. The temperature of substrate has the most important influence on the optical properties. The optimum technique for best optical properties is that the substrate temperature is 300 癈 ,the chamber vacuum is 2xlO~2 Pa, the deposition rate is 0.2 nm/s. The thin films deposited by the optimumtechnique show excellent transmittance properties in visible region. The SEM observation shows that the TiQi films deposited by EB on K9 substrates havecolumnar fibrous.The influence of anneal to film’s structure was also studied. The specimensdeposited under different temperature are annealed and the structure and optical properties are analyzed. The results indicate that the anneal can make the amorphous film structure crystallized and make the refractive indices higher, the absorption conditions are also improved. Then we got the process how to get high opticalproperties TiOi films deposited by EB on K9 glass.In order to design and deposit the multi-layer optical thin films with TiOi as the coating material. The author develop a film system design software by visual basic which can optimize thin film system by simplex method, calculate the optical performance, analysis the transmission spectrum and calculate the refractive index and extinction coefficient and thickness through the envelope method. The work principle, the program and the result are described. The author designs aTiO2-MgF2 anti-reflectance multi-layer film. The theory optical transmittance can be over 99% between the 400nm and 700nm.The specimen was trial-produced and the optical transmittance can be over 97%.

  • 【分类号】TB43
  • 【被引频次】6
  • 【下载频次】553
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