【作者】 满小花；

【导师】 巴德纯；

【作者基本信息】 东北大学 ， 化工过程机械， 2009， 硕士

【摘要】 本文首先介绍了磁控溅射镀膜过程中等离子体的性质、主要参数、气体放电过程以及等离子体的研究现状。其次概述了磁控溅射技术的发展状况、磁控溅射原理及特点；并分析了溅射沉积薄膜的各种工艺参数对薄膜特性的影响尤其是等离子体离子流密度和能量对薄膜的影响。对射频磁控溅射镀膜机等离子体离子流密度的分布规律进行系统地研究。引入离子电流密度这个概念,并用离子电流密度来表征射频磁控溅射镀膜机内等离子体离子流密度。本文利用法拉第探针测量离子流密度。详细地介绍了法拉第探针的结构设计、工作原理和测量系统。开发了相应的计算机数据采集系统。对射频磁控溅射镀膜机等离子体离子能量的分布规律进行了研究。使用法拉第能量分析器测量离子能量。详细地介绍了法拉第能量分析器的结构设计工作原理及测量系统。使用法拉第探针成功地测量出在工作气压(1Pa-2Pa)、射频放电功率(30W-90W)范围内磁控溅射镀膜机内离子流密度分布规律。并发现离子流密度分布规律和实验后靶材的刻蚀情况相吻合。此外,还利用法拉第能量分析器成功地测量出在工作气压(1.5Pa)、射频放电功率(30W-90W)范围内磁控溅射镀膜机内离子能量的分布规律。发现实验测量得到的离子平均能量与利用OOPIC模拟得到的离子平均能量比较吻合,两者的相对误差在14.7%左右。更多还原

【Abstract】 This thesis introduces firstly the character and the main parameter of the plasma in the process of the Magnetron sputtering filming, the discharge process, and the research actuality about plasma. Secondly this thesis summarizes the development of the Magnetron sputtering, the principle and the characteristic of the Magnetron sputtering. In addition This thesis analyses that the influences which kinds of technological parameter of sputtering sediment filming affect the character of the film, especially the influences of the ion density and the ion en-ergy affects the film.This thesis studies systemically the distribution regularity of the ion density of the plasma in radio frequency Magnetron sputtering filming machine. Intro-duces the concept of the ion current density, and uses the ion current density to describe the ion density of the plasma in radio frequency Magnetron sputtering filming machine. It uses the Faraday probe to measure the ion current density in the paper. And it introduces in detail the structured design, the principle of opera-tion, the measure system of the Faraday probe. It designs the relevant computer data acquisition system.This thesis studies systemically the distribution regularity of the ion energy of the plasma in radio frequency Magnetron sputtering filming machine. It uses the Faraday energy analyzer to measure the ion energy in the paper. It introduces in detail the structured design, the principle of operation, the measure system of the Faraday energy analyzer.It is successful for the Faraday probe to measure the distribution regularity of the ion current density of the plasma in radio frequency Magnetron sputtering filming machine in the condition that the background pressure changes from 1Pa to 2Pa and the radio frequency discharge power is from 30W to 90W. And the distribution regularity of the ion current density is the same as the sculpture con- dition of the target after the experiment. Besides, it is also is successful for the Faraday energy analyzer to measure the distribution regularity of the ion energy of the plasma in radio frequency Magnetron sputtering filming machine in the con-dition that the background pressure is 1.5Pa and the radio frequency discharge power changes from 30W to 90W. The ion average energy measured by experiment is the same as the ion average energy simulated by OOPIC. Fractional error be-tween the ion average energy measured by experiment to the ion average energy simulated by OOPIC is about 14.7%.更多还原