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酞菁铜和苝酰亚胺的溶解及纳米薄膜的制备

Dissolved and Nano Film Fabricated of Copper Pthalocyanine and Perylene Diimide

【作者】 钱凌峰

【导师】 薛敏钊;

【作者基本信息】 上海交通大学 , 化学工程, 2011, 硕士

【摘要】 本文通过测定酞菁铜(CuPc)和花酰亚胺(PTCDI)在不同的有机溶剂中的可见光吸收光谱,研究了不同溶剂以及加入不同量的三氟乙酸(TFAA)对酞菁铜和花酰亚胺溶解性的影响。研究发现质子酸三氟乙酸对于酞菁铜以及花酰亚胺的溶解均具有增溶作用,主要机理是质子酸与这两种材料发生质子化反应,从而提高了它们在有机溶剂中的溶解性,这种溶解的实质是化学反应过程。不同有机溶剂对酞菁铜以及花酰亚胺的溶解性能差异较大,酞菁铜在硝基甲烷以及氯仿中溶解情况良好,而花酰亚胺则更易溶于氯仿溶液中。以溶解性研究为基础,探讨了不同条件下电沉积法制备酞菁铜薄膜形貌的影响。以硝基甲烷为溶剂时,薄膜为花状结构,基本组成是一维纳米线,而以氯仿为溶剂时,薄膜是由直径约为100nm,长度为500nm的梭状晶体构成。通过紫外吸收光谱图表征,证明两种溶剂电化学沉积所得薄膜的组成相同,都为α-CuPc。通过扫描电镜(SEM)表征,发现改变电沉积时采用的电压,电沉积时间,溶液浓度可以控制纳米酞菁铜薄膜的形貌和尺寸。发现TFAA及酞菁铜的量对其薄膜的形貌影响较大,而沉积时间和沉积电压则影响较微弱。通过扫描电镜(SEM)表征,发现沉积电压对于花酰亚胺薄膜晶体生长具有导向作用,薄膜基本组成是直径约为100nm,且与基底垂直的棱柱状纳米晶体。改变电沉积时采用的电压,电沉积时间,溶液浓度能够得到晶体分布均匀,排列整齐致密的薄膜层。花酰亚胺与酞菁铜共沉积所得复合膜,既存在酞菁铜薄膜的形貌特征,也存在花酰亚胺薄膜的形貌特征。

【Abstract】 In this article, by testing the UV-vis absorption spectra of copper pthalocyanine (CuPc) and perylene diimide (PTCDI), studied the solubility of CuPc and PTCDI in different solvents, and the effect of various amounts of trifluoroacetic acid (TFAA) to them. UV-vis specrum shows that the trifluoroacetic acid is good to the dissolving of CuPc and PTCDI, because TFAA and these two materials make to be protonic, which can increase the solubility of them. CuPc and PTCDI have different solubilities in different organic solvents. CuPc is dissolved well in nitromethane (NME) and chloroform (CHCl3), while PTCDI is more easily dissolved in CHCl3.Basied on the reaserch of solubility, the CuPc and PTCDI films are fabricated with different electro-chemical deposition conditions. When the solvent is NME, the CuPc films are flower shape structure, the basic compose is nanowires. If the solvent is chloroform, the CuPc films are formed by spindle crystals, the diameter is 100nm, and the length is 500nm. The UV-vis spectrums of the two kinds of films show that they have the same crystal form(α-CuPc). Using the scanning electron microscopy (SEM) observes the surface morphology of CuPc films. The result showed that:The amount of TFAA and CuPc has great influence to the surface morphology, while the deposition time and voltage impacts are feeble.The SEM pictures of PTCDI show that:The deposit voltage can effect the crystal growth direction, the basic compose of films is the prismatic nanocrystal, the crystal is perpendicular to the basement and its diameter is 100nm. Changing the deposited voltage, time and solution concentration can get PTCDI films with good surface morphology, the crystals in these films are homogeneously distributed, aligned and compact. The composit films of CuPc and PTCDI, not only have the morphological characters of CuPc, but also have the morphological characters of PTCDI.

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