【作者】 赵圣哲；

【导师】 富丽晨； 陈大鹏；

【作者基本信息】 长春理工大学 ， 微电子学与固体电子学， 2010， 硕士

【摘要】 本论文所提出的微尖端阵列无掩模光刻系统扩展了纳米加工的手段,是未来光刻技术发展的一种趋势。通过对本系统的研究,无需掩模,微尖端的发射电流就可直接曝光光刻胶,进行图形生成及加工,还通过阵列并行直写大大提高了工作效率。取得的主要研究成果如下：1,设计并制做了无掩模光刻系统中的核心器件—微尖端阵列器件,开发了一整套用于制作微尖端阵列器件的MEMS制作工艺,并创新的提出了使用微尖端阵列来进行电子束直写。2,完整的制作了一套无掩模光刻平台,并完成了CIF版图文件到微动台可识别的二进制编码的转换。3,对微尖端阵列器件发射电子的能力进行了测试,取得了理想的测试结果。更多还原

【Abstract】 In this paper, a maskless lithography system is proposed. It provides a new method to nanofabrication and it is the trend for next generation lithography technology. Based on this system, there is no need to use masks in lithography processes to generate and process patterns because the current emitted from micro tip can directly exposure the photoresist. The working efficiency is greatly enhanced through array parallel writing.The main research achievements are listed as follows:1. The micro-tip array which is the key element of the maskless lithography system is designed and fabricated and the standard processings for the micro-fabrication are developed. The field electron emission through the micro-tip array is verified.2. The vacuum system for maskless lithography is set up completely. The transformation from CIF to binary coding which can be recognized by the micropositioner is accomplished.3. The efficiency of electron emission of microtip array is tested and good experimental results are received.更多还原