【摘要】 通过浸渍-高温煅烧法制备多孔MoS₂/g-C₃N₄光催化剂,采用X射线衍射（XRD）、透射电子显微镜（TEM）、扫描电子显微镜（SEM）、N2吸附-解吸、紫外-可见光（UV-vis）漫反射吸收光谱对材料进行表征;并在可见光照射下,对四环素（TC）进行光催化降解。结果表明,催化剂量为2.0 g·L-1、pH为5.0时,对TC的去除效果最好,可见光照射180 min,MoS₂/g-C₃N₄（1.0%-MC）复合材料对TC的降解率可达80.6%。反应完成后,复合材料循环利用5次,其降解效率仍保持在70.0%以上。浸渍-高温煅烧法所制备的MoS₂/g-C₃N₄光催化剂具有良好的应用前景。更多还原

【Abstract】 The unique porous MoS₂/g-C₃N₄ heterojunction photocatalyst was successfully constructed by a facile impregnation and calcination method. The obtained MoS₂/g-C₃N₄ composites were characterized by X-ray diffraction（XRD）, scanning electron microscopy（SEM）, transmission electron microscopy（TEM）, N2 adsorptiondesorption, and ultraviolet-visible（UV-vis） diffuse reflection spectroscopy. Then it was used to photocatalytic degrade tetracycline（TC） under visible light irradiation. The results showed that the optimum TC degradation effect was achieved at MoS₂/g-C₃N₄（1.0%-MC） dosage of 2.0 g·L-1 and pH 5.0. After 180 min visible light irradiation, the removal rate of TC reached 80.6%. The used MoS₂/g-C₃N₄ could be recycled for 5 times, and its degradation rate for TC maintained above 70.0%. The MoS₂/g-C₃N₄ composites prepared by facile impregnation and calcination method have a good application prospect.更多还原