【作者】 田连朋；

【导师】 左禹；

【作者基本信息】 北京化工大学 ， 材料物理与化学， 2006， 博士

【摘要】 本文研究了几种外加离子对铝合金阳极氧化膜电化学性质的影响，利用动电位极化和电化学阻抗谱(EIS)研究了铝合金阳极氧化膜的腐蚀行为，利用扫描电子显微镜(SEM)和原子力显微镜(AFM)观察了铝合金阳极氧化膜的表面形貌，用X射线光电子能谱仪(XPS)分析了铝合金阳极氧化膜层的表面成分。 利用离子注入技术在铝合金表面注入钛，再进一步进行阳极氧化，获得了铝钛复合阳极氧化膜层，使阳极氧化膜表面形貌更加平整均匀，提高了铝合金阳极氧化膜的致密度；钛离子注入可以使铝合金阳极氧化膜在酸性和碱性NaCl溶液中的耐蚀性明显提高，但是并不影响铝合金阳极氧化膜的非晶态结构。 研究了镍离子和铬离子注入对铝合金阳极氧化膜电化学性能的影响，通过分析铝合金阳极氧化膜表面成分和显微结构，结合电化学测试结果，讨论了离子注入提高铝合金阳极氧化膜耐蚀性能的微观机制。镍离子注入使得铝阳极氧化膜表面结构和形态更加致密均匀，注入的镍在铝合金阳极氧化膜层中以金属镍和氧化镍的形式存在。经过镍离子注入的阳极氧化膜在-1.0V到-0.5V的电位范围内呈现p型半导体性质。经镍离子注入的阳极氧化膜在NaCl溶液中有相对较高的耐蚀性。特别是在碱性NaCl溶液中，镍离子注入可以很大地提高阳极氧化膜的耐蚀性，增强了铝阳极氧化膜在溶液中的自封闭作用。 经过铬离子注入的阳极氧化膜电化学阻抗谱的高频段阻抗值变大。R_p值增加，而C_p值减小。铬离子注入加速了铝阳极氧化膜在溶液中的自封闭作用。在浸泡的初期，铬离子注入使得阳极氧化膜多孔层电阻R_p增加，而电容C_p减小。随着浸泡时间的进一步延长，未经铬离子注入的阳极氧化膜的C_p和R_p变化相对较慢，而经过离子注入更多还原

【Abstract】 Commercial pure aluminum L3 was implanted by Ti ions and then anodic oxidation was carried out. XPS analysis revealed that Ti is present in the anodic film as TiO₂. The XRD investigations proved that Ti ions implantation does not lead to the formation of a crystal state. The EIS results show that anodic oxide films implanted by Ti ions provide relatively higher corrosion resistance both in acidic and in basic solutions. After implantation of Ti ions, the R values increased and the C values decreased, which showed a more difficult penetration of the aggressive electrolyte into the anodic oxide film on the L3 aluminum and its less porosity.The influence of Ni ions implantation on corrosion resistance of anodic films on aluminum was studied. Atomic force microscope （AFM） observations show that the implantation of Ni ions makes the surface structure and morphology of anodic films more uniform. XPS analysis reveals that Ni is present in the states of metallic Ni and NiO on the surface of the anodic film. Electrochemical results show that anodic films with Ni ions implantation provide relatively higher corrosion resistance both in acidic and in basic solutions. Ni ions implantation mainly affects the property of porous layer, which is characterized by the capacitance C_p and the resistance R_p After Ni ions implantation, R_p values increased and C_p values decreased, which shows a more difficult penetration of the aggressive electrolyte into the anodic film. The concentration of Ni and formation of NiO on the surface of anodic film, which block the pores in the film, should be the main reason for better corrosion resistance of the implanted samples. The semi conductive property of anodic films in basic NaCl更多还原