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光伏法研究掺金硅特性

Study on Properties of Au-Doped Silicon by Photovoltaic Method

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【作者】 朱文章沈顗华刘士毅

【Author】 Zhu Wenzhang(Physics Section,Jimei Navigation Institute, Xiamen 361021) Shen Yihua;Liu Shiyi(Dept.of Physics,Xiamen University,Xiamen 361005)

【机构】 厦门集美航海学院物理室厦门大学物理系

【摘要】 本文采用光伏方法测量掺金硅的少子寿命,掺金浓度为1012~6.62×1015cm-3,4个数量级;根据对两类不同电阻率的N型掺金硅少子寿命系统的测量和统计计算,提出了对硅中金性质的看法。统计计算及简并因子和金施主与金受主的相关性,实验和计算结果都表明,高浓度金掺杂可以改变N型高阻硅的导电类型。

【Abstract】 The minority carrier lifetime of Au-doped silicon has been measured by photovoltaic method.The Au-doped concentrations are between 10 ̄(12) ̄ 6.62×10 ̄(15)cm ̄(-3),covering four orders of magnitude.On the basis of the systematic measurement and the statistical calculation of minority carier lifetime of two kinds of N-type Au-doped sihcon with different resistance,the views on the properties of Au in silicon are presented.The degeneracy factors and the interrelation between Au donor and acceptor are taken into account in statistical calculation. Both experimental and calculated results show that Au doping at high concentration can change N-type high-resistance silicon into P-type.

【基金】 国家自然科学基金
  • 【文献出处】 电子学报 ,ACTA ELECTRONICA SINICA , 编辑部邮箱 ,1995年02期
  • 【分类号】TN305.3
  • 【被引频次】1
  • 【下载频次】65
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